The Eclipse MA200 is an inverted materials microscope with an innovative design that has been optimized for digital imaging and ergonomic efficiency. The MA200 uses integrated intelligence to automatically combine captured images with data on their observation settings for more comprehensive documentation. Additionally, its new and unique box design allows easy access to the sample on the stage and nosepiece, while making the footprint size one third of the conventional model.
The compact design employs internal turrets that keep dust off the illumination filters, maintaining bright uniform illumination. Also, the power supply is built-in to save space.
Nikon's world-class CFI60-2 optics provide clear, high-contrast brightfield images and darkfield images with three times the brightness of conventional models.
Improved uniformity of illumination delivers clear images, especially for digital imaging.
The MA200 features a super-wide field of view with an eyepiece diameter of 25mm. With the combination of the newly developed 1x objective lens, a sample of 25mm diameter can be observed in a single field of view.
Nikon's DS-U2 Camera Control Unit and NIS-Elements Imaging Software allow the user to perform everything from basic image capture to the measurement, analysis, and management of captured images.
Displays information such as objective lens magnification and illumination conditions. The calibration data is automatically changed when the objective magnification is changed. This feature makes the measurement function and other optional software modules such as grain sizing and cast iron analysis module in the NIS-Elements easy to use.
Quantitative illumination adjustment, which is crucial when acquiring the optimum settings for observation, image capture and especially large image stitching, can be made via PC control.
Adjacent images can be put together to create an image with a wide field. It is now possible to capture even more vivid images due to the improved uniformity of the illumination system.
Measures grain size and displays results based on JIS and ASTM standards.
Measures the graphite nodularity of ground cast iron and displays results based on JIS nd ASTM standards.
Built-in, high-definition, large 8.4-inch XGA LCD screen lets you view & discuss the sample without the need to look in the eyepieces.
Captured images can be saved to USB memory or a CF card. In addition to printing directly via a PictBridge-compatible printer, you can save data onto a server over a LAN.
Displays information for the objective lens and illumination conditions. Since the correct calibration data is automatically changed when changing magnification, the DS-L3's simple measurement function can be easily employed.
Quantitative illumination adjustment can be made manually by viewing the voltage value. This is crucial when acquiring the optimum settings for observation and image capture.
The 50 W halogen light source realizes the same brightness as the previous 100 W light source with only about half the power consumption.
|
Main body |
Focusing mechanism Illumination Light distribution |
|---|---|
|
Optics |
CFI60 /CFI60-2 system |
|
Observation image |
Surface Image |
|
Observation method |
Bright/Darkfield/Simple Polarizing/DIC/Epi-Fluorescence |
|
Resolving nosepieces |
MA2-NUI5: Bright/Darkfield/ DIC 5 position nosepiece, LV-NU5A: Motorized Bright/Darkfield/DIC 5 position nosepiece |
|
Stage |
MA-SR Rectangular 3-plate Stage |
|
Trinocular eyepiece |
Seidentopf, interpupillary distance adjustment 50-75 mm |
|
Power input |
100-240 V, 50-60 Hz |
|
Electrical power consumption |
1.2 A 75 W |
|
Weight |
Approx. 26 kg (depends on combination) |
|
Option |
Intermediate magnification Scale |
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